英语翻译The Filtered Arc Deposition (FAD) system based on the ‘enhanced arc’ principle is suitable to deposit high quality electrical and optical coatings [44].A recent trend has been to combine the advantages of sputtering and cathodic arc t

英语翻译The Filtered Arc Deposition (FAD) system based on the ‘enhanced arc’ principle is suitable to deposit high quality electrical and optical coatings [44].A recent trend has been to combine the advantages of sputtering and cathodic arc t
英语翻译
The Filtered Arc Deposition (FAD) system based on the ‘enhanced arc’ principle is suitable to deposit high quality electrical and optical coatings [44].
A recent trend has been to combine the advantages of sputtering and cathodic arc techniques.The Arc Bond Sputter (referred to as ABS) PVD technique was developed by combining the features of steered cathodic arc and unbalanced magnetron processes [33,36?/39].This technique yields coatings with high levels of adhesion,dense structure,and provides a smooth macro particle free surface.In the ABS technique,the cathodes can be evaporated either by the arc method or the sputtering method.In some cases,the arc mode was used only to metal ion etch or bombard the substrate prior to actual coating deposition by unbalanced magnetron sputtering [34?/36].A hybrid arc-magnetron process (where magnetron sputtering of a pure aluminum cathode was coupled with cathodic arc vaporation of a TiAl alloy cathode) resulted in a (Ti,Al)N coating with a low number of macro particles and excellent adhesion [39].Donohue et al.[33] suggested deposition of highly reactive elements,such as Group IVa elements,by steered arc mode,and of less reactive elements,by unbalanced magnetron sputtering mode.The approach
by Donohue et al.[33] minimized poisoning of targets by reactive gases,especially when the reactivity of the elements differ widely.
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英语翻译The Filtered Arc Deposition (FAD) system based on the ‘enhanced arc’ principle is suitable to deposit high quality electrical and optical coatings [44].A recent trend has been to combine the advantages of sputtering and cathodic arc t
过滤弧沉积(时尚)系统基于“提高弧”原则是适用于存款高品质电气和光学涂层[44].
最近的一个趋势是溅射和阴极弧技术的优势结合起来.电弧债券溅射(称为ABS)PVD技术是由结合带领阴极电弧的特性和不平衡磁控管流程(33岁,36 ? / 39).这种技术产量与高水平的涂料附着力、致密结构,提供了宏观粒子自由表面光滑.ABS技术,阴极弧方法可以蒸发或溅射方法.在某些情况下,弧模式是只用于金属离子蚀刻或轰击衬底之前实际涂层由不平衡磁控溅射沉积(34 ? / 36).混合arc-magnetron过程(纯铝的磁控溅射阴极在哪里加上阴极电弧蒸发多弧离子镀合金阴极)导致(Ti,艾尔)N层的宏观粒子和优异的附着力[39].Donohue et al .[33]建议高活性元素的沉积,如集团IVa元素,通过引导弧模式,和更少的活性元素,不平衡磁控溅射模式.的方法
Donohue et al.[33]最小化目标中毒的反应气体,特别是当元素的反应存在很大的不同.